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AssigneesTsinghua University, Beijing U-Precision Tech Co., Ltd.
InventorsLeijie Wang, Yu Zhu, Ming Zhang, Rong Cheng, Yuezhu Yang, Xin Li, Kaiming Yang
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A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.
A device for regulating and controlling an incident angle of a light beam in a laser interference lithography process, which is applied to a laser interference lithography system, the laser interference lithography system comprises a substrate, a first lens and a second lens facing each other, and a first universal reflecting mirror located at a focus of the first lens,
A method for regulating and controlling an incident angle of a light beam in a laser interference lithography process, comprising the following steps:
Dependencies are inferred from the claim text.