Device and method for producing thin-film catalyst

A device for producing a thin-film catalyst, comprising:

• a vacuum chamber configured to create a vacuum environment;
• a plurality of evaporators arranged in the vacuum chamber and configured to evaporate at least one film material;
• a plurality of gas guide pipes arranged in the vacuum chamber and configured to introduce a reactive gas;
• an ion generator arranged in the vacuum chamber and configured to ionize the reactive gas and an evaporated film material;
• and
• a control unit connected to the vacuum chamber, the plurality of evaporators, the plurality of gas guide pipes, and the ion generator, wherein the control unit is configured to control the vacuum chamber to be vacuumed, control at least two evaporators of the plurality of evaporators to be simultaneously started, control the plurality of gas guide pipes to introduce the reactive gas, and control an ion source current of the ion generator to be adjusted, such that the evaporated film material reacts with the reactive gas to form a catalytic film layer on a surface of a substrate through vapor deposition;
• wherein the thin-film catalyst is a medium-entropy alloy (MEA)/high-entropy alloy (HEA) thin-film catalyst or a high-entropy ceramic (HEC) thin-film catalyst or a multi-metallic element ceramic thin-film catalyst;
• the device further comprises a winding mechanism, wherein the winding mechanism is arranged in the vacuum chamber and configured to rotate the substrate along a central axis of the vacuum chamber, the winding mechanism comprises a plurality of plates and a plurality of rollers connected between two opposite side plates of the plurality of plates, each of the plurality of rollers rotates along an axis perpendicular to the central axis of the vacuum chamber, the substrate is conveyed along the plurality of rollers.