Multiple disk pad conditioner
AssigneeApplied Materials, Inc.
InventorsJay Gurusamy, Steven M. Zuniga, Takashi Fujikawa, Jeonghoon Oh
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AssigneeApplied Materials, Inc.
InventorsJay Gurusamy, Steven M. Zuniga, Takashi Fujikawa, Jeonghoon Oh
Estimating the term…
Embodiments of the present disclosure provide a multiple disk pad conditioner and methods of using the multiple disk pad conditioner during a chemical mechanical polishing (CMP) process. The multiple disk pad conditioner has a plurality of conditioning heads having conditioning disks affixed thereto. The multiple disk pad conditioner can include a conditioning arm, and a plurality of conditioning heads attached to the conditioning arm. Each of the plurality of conditioning heads has a conditioning disk affixed thereto. In some embodiments, each of the conditioning heads include a rotational axis, wherein each of the rotational axes is disposed a distance apart in a first direction that extends along the length of the conditioning arm.
A multiple disk pad conditioner for conditioning a polishing pad, comprising:
A method of conditioning a polishing pad, comprising:
A polishing system, comprising:
Dependencies are inferred from the claim text.