Liquid delivering system for wafer cleaning equipment

A liquid delivering system for wafer cleaning equipment comprising an acid scouring tank, a sulfuric acid supplying source and a hydrogen peroxide supplying source, characterized in that the system further comprises a first mixing device, a second mixing device, a feedback-control panel, a third mixing device and a cooling circulation device;

• said first mixing device and said second mixing device both includes a mixing duct, a multi-section mixing screw rod arranged inside said mixing duct and a heater wrapped around said mixing duct;
• two principal inlets of said first mixing device lead to said sulfuric acid supplying source and said hydrogen peroxide supplying source through a principal sulfuric acid pipe and a principal hydrogen peroxide pipe, respectively;
• one principal inlet of said second mixing device leads to one principal outlet of said first mixing device;
• two ancillary inlets of said second mixing device lead to said sulfuric acid supplying source and said hydrogen peroxide supplying source through a sulfuric acid adjusting pipe and a hydrogen peroxide adjusting pipe, respectively;
• a principal outlet of said second mixing device leads to said acid scouring tank;
• a thermometer and an oxygen concentration meter are arranged on both of the principal outlet of said first mixing device and the principal outlet of said second mixing device;
• a flow valve is arranged on each of said principal sulfuric acid pipe, said principal hydrogen peroxide pipe, said sulfuric acid adjusting pipe and said hydrogen peroxide adjusting pipe;
• said third mixing device includes a mixing duct, a multi-section mixing screw rod arranged inside said mixing duct, a heater wrapped around said mixing duct and a cooling passage;
• a principal inlet of said third mixing device leads to the principal outlet of said second mixing device;
• the principal inlet of said third mixing device leads to said acid scouring tank;
• said cooling passage is provided with a coolant inlet and a coolant outlet, and said coolant inlet and said coolant outlet lead to an outlet end and an inlet end of said cooling circulation device through said cooling passage, respectively;
• and
• said heater, said thermometer, said oxygen concentration meter, said cooling circulation device and said flow valve are electrically connected to said feedback-control panel;
• and a principal outlet of said third mixing device is also provided with a thermometer and an oxygen concentration meter that are electrically connected to said feedback-control panel.