Physical vapor deposition (PVD) with target erosion profile monitoring

A method comprising:

• introducing a physical vapor deposition (PVD) target in a PVD system, the PVD target comprising:
• a target plate comprising a target material, wherein the target plate having a flat top surface;
• and
• a backing plate comprising:
• a central section;
• a peripheral section circumferentially surrounding the central section in a horizontal plane, wherein the peripheral section has a first thickness in a vertical direction, the central section has a second thickness in the vertical direction, and the first thickness is larger than the second thickness, and wherein the peripheral section of the backing plate bends upward after the target material is consumed;
• and
• a flat bottom surface, wherein the flat bottom surface of the backing plate is attached to the flat top surface of the target plate, defining a flat interface between the backing plate and the target plate;
• and
• depositing the target material on a substrate;
• and
• monitoring usage of the target plate.

A physical vapor deposition (PVD) target comprising:

• a target plate comprising a target material, wherein the target plate having a flat top surface;
• and
• a backing plate comprising:
• a central section;
• a peripheral section circumferentially surrounding the central section in a horizontal plane, wherein the peripheral section has a first thickness in a vertical direction, the central section has a second thickness in the vertical direction, and the first thickness is larger than the second thickness, and wherein the peripheral section of the backing plate bends upward after the target material is consumed;
• and
• a flat bottom surface, wherein the flat bottom surface of the backing plate is attached to the flat top surface of the target plate, defining a flat interface between the backing plate and the target plate.