Metrology for improving DUV laser alignment
AssigneeCymer, Inc.
InventorZhong Quan Zhao
Life of this patent
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AssigneeCymer, Inc.
InventorZhong Quan Zhao
Estimating the term…
A light source apparatus includes a gas discharge stage, a sensing apparatus, an optical arrangement, an adjustment apparatus, and a control apparatus. The gas discharge stage includes an optical amplifier including a chamber configured to hold a gas discharge medium outputting a light beam, and a set of optical elements configured to form an optical resonator around the optical amplifier. The optical arrangement is configured to image light from a plurality of distinct object planes within the gas discharge stage onto the sensing apparatus. The adjustment apparatus is in physical communication with one or more optical components within the gas discharge stage and is configured to modify at least one geometric aspect of the optical components. The control apparatus is communication with the sensing apparatus and the adjustment apparatus and is configured to provide a signal to the adjustment apparatus based on an output from the sensing apparatus.
A light source apparatus comprising:
An imaging apparatus comprising:
A method of aligning a gas discharge stage outputting a light beam and comprising a chamber having a first optical port and a second optical port, an input/output optical element in optical communication with the first optical port, and a spectral feature adjuster in optical communication with the second optical port, the method comprising:
Dependencies are inferred from the claim text.