Apparatus for smoothly exhausting the atmosphere in a processing space when rotating a substrate with liquid

An apparatus for processing a substrate comprising:

• a first processing unit comprising a first processing container configured to have a first inner space and a first support unit, wherein the first support unit supports, and rotates the substrate within the first inner space;
• a second processing unit comprising a second processing container configured to have a second inner space and a second support unit, wherein the second support unit supports, and rotates the substrate within the second inner space;
• wherein the first processing unit and the second processing unit are arranged in a unit arrangement direction;
• and
• an exhaust unit configured to exhaust the first inner space and the second inner space, wherein the exhaust unit comprises:
• an integrated duct having a portion positioned in a Y axial direction when the unit arrangement direction is in an X axis, wherein a longitudinal direction of the integrated duct is substantially parallel with the unit arrangement direction;
• a first exhaust pipe configured to have a first exhaust port for introducing the atmosphere of the first inner space to the integrated duct and exhaust the atmosphere of the first inner space to the integrated duct;
• and
• a second exhaust pipe configured to have a second exhaust port for introducing the atmosphere of the second inner space and exhaust the atmosphere of the second inner space to the integrated duct,
• wherein the integrated duct comprises a first wall member configured to partition a first exhaust path in the integrated duct,
• wherein the first wall member starts between a first position where the first exhaust pipe is connected with the integrated duct and a second position where the second exhaust pipe is connected with the integrated duct and, the first wall member extends along an exhaust direction of the first exhaust path,
• wherein the first wall member partitions a first exhaust path in connection with the first exhaust pipe and a second exhaust path in connection with the second exhaust pipe,
• wherein the first position is downstream from the second position in the exhaust direction of each of the first exhaust path and the second exhaust path,
• wherein the atmosphere of the first interior space exhausted through the first exhaust path and the atmosphere of the second interior space exhausted through the second exhaust path join downstream of the first wall member, and
• wherein the first wall member has a first part and a second part, and
• wherein the first part is in contact with an inner wall of the integrated duct and is disposed inclined with respect to the longitudinal direction of the integrated duct, and the second part extends from the first part and is disposed parallel to the longitudinal direction of the integrated duct, wherein the second part extends parallel to an outer wall of the exhaust unit in the exhaust direction of the first exhaust path and the second exhaust path.