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US 12,327,579 B2Granted
Inspection device
AssigneeSamsung Electronics Co., Ltd.
InventorsShinji Ueyama, Ingi Kim, Harutaka Sekiya, Tomoki Onishi
Life of this patent
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Abstract
To reduce a measurement time, an inspection device includes a stage configured to fix a magnetoresistive random access memory (MRAM) to a stage surface and moving the MRAM, a plurality of magnets configured to generate a gradient magnetic, a plurality of line sensors comprising a first line sensor for detecting a magneto-optical effect at a first location of the MRAM and a second line sensor for detecting the magneto-optical effect at a second location that is different from the first location by moving a location of the MRAM within the gradient magnetic field, and an information processor configured to process the magneto-optical effect detected by the plurality of line sensors. Thus, throughput may be improved.
Claims12
An inspection device comprising:
- a stage configured to fix a magnetoresistive random access memory (MRAM) to a stage surface and to move the MRAM within an inspection surface parallel to the stage surface;
- a plurality of magnets configured to generate a gradient magnetic field in which a direction of a magnetic field component perpendicular to the inspection surface is changed from a first direction to a second direction antiparallel with the first direction by a position of the inspection surface;
- a plurality of line sensors comprising a first line sensor configured to detect a magneto-optical effect at a first location of the MRAM and a second line sensor configured to detect the magneto-optical effect at a second location that is different from the first location, the first line sensor and the second line sensor configured to detect the magneto-optical effect by moving a location of the MRAM within the gradient magnetic field;
- and
- an information processor configured to execute machine-readable instructions that, when executed by the information processor, cause the information processor to process the magneto-optical effect detected by the plurality of line sensors.
2 more elements
An inspection device comprising:
- a stage having a stage surface to which a wafer is configured to be fixed, and configured to move the wafer within an inspection surface parallel to the stage surface, wherein the wafer includes at least one of a plurality of magnetoresistive random access memories (MRAMs) or a beta film of a perpendicular magnetization layer before formation of the MRAM;
- a plurality of magnets configured to generate a gradient magnetic field in which a direction of a magnetic field component perpendicular to the inspection surface is changed from a first direction to a second direction antiparallel with the first direction by a position of the inspection surface;
- a plurality of line sensors comprising a first line sensor for detecting a magneto-optical effect at a first location of the MRAM and a second line sensor for detecting the magneto-optical effect at a second location that is different from the first location by moving a location of the MRAM within the gradient magnetic field;
- and
- an information processor configured to execute machine-readable instructions that, when executed by the information processor, cause the information processor to process the magneto-optical effect detected by the plurality of line sensors.
2 more elements
An inspection device comprising
- a stage having a stage surface to which a wafer is configured to be fixed, the stage configured to move the water within an inspection surface parallel to the stage surface, and including a plate member including a magnetic body, wherein the wafer includes at least one of a plurality of magnetoresistive random access memories (MRAMs) or a beta film of a perpendicular magnetization layer before formation of the MRAM, and the plate member is buried in the stage;
- a plurality of magnets configured to generate a gradient magnetic field in which a direction of a magnetic field component perpendicular to the inspection surface is changed from a first direction to a second direction antiparallel with the first direction by a position of the inspection surface;
- a plurality of line sensor comprising a first line sensor configured to detect a magneto-optical effect at a first location of the MRAM and a second line sensor configured to detect the magneto-optical effect at a second location that is different from the first location, the plurality of line sensors configured to detect the magneto-optical effect by moving a location of the MRAM within the gradient magnetic field;
- and
- an information processor configured to execute machine-readable instructions that, when executed by the information processor, cause the information processor to process the magneto-optical effect detected by the plurality of line sensors, wherein
- the plurality of line sensors are configured to detect at least one of the magneto-optical effect by the magnetic field component in the first direction, the magneto-optical effect b the magnetic field component in the second direction, and the magneto-optical effect by a magnetic field component in a direction perpendicular to the inspection surface,
- the information processor is configured to be caused to inspect the MRAM through a difference between the magneto-optical effect detected by the first line sensor and the magneto-optical effect detected by the second line sensor, and
- a region surrounded by an outer edge of the plate member when viewed in a direction perpendicular to the stage surface includes the MRAM fixed to the stage surface.
5 more elements
Dependencies are inferred from the claim text.