Inspection apparatus and inspection method

An inspection apparatus to inspect a substrate for or of a reflective reticle, wherein the substrate is configured to be illuminated by radiation having an actinic wavelength to expose a pattern from the reticle, the inspection apparatus comprising:

• one or more radiation sources configured to output a first inspection radiation having one or more first wavelengths within a first wavelength range between 20 nm and 150 nm toward the substrate and a second inspection radiation having one or more second wavelengths within a second wavelength range toward the substrate, the second wavelength range comprising wavelengths shorter than the first wavelength range and comprising the actinic wavelength;
• and
• a detector configured to detect radiation from the substrate for detecting a defect on the substrate,
• wherein the apparatus is configured to perform a coarse inspection of the substrate using the first inspection radiation and perform a fine inspection of the substrate using the second inspection radiation.