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US 12,325,044 B2Granted
Method for protecting air-sensitive or evaporation-sensitive objects
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsJean Christophe Gabriel, Monika Spano, Fatima-Ezzahra Hami
Life of this patent
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Abstract
A method for depositing a film on a substrate, which includes the steps of forming a film using a liquid composition that includes a neutral surfactant and a charged lamellar compound, placing the film in contact with the substrate and depositing the film on substrate. Also, a process for analyzing a substrate onto which a film has been deposited by the method.
Claims15
A process for depositing a film onto a substrate using a liquid composition, comprising the following steps:
- a) formation of a film in the form of a bubble using the liquid composition,
- b) placing the film in the form of a bubble in contact with the substrate, and
- c) depositing the film in the form of a bubble on the substrate,
- wherein the liquid composition comprises a neutral surfactant and a charged lamellar compound, in which the liquid composition is obtained by mixing the charged lamellar compound with the neutral surfactant and the concentration of neutral surfactant before mixing with the charged lamellar compound is less than 0.95 of the critical micelle concentration (CMC) of said surfactant.
1 more element
Dependencies are inferred from the claim text.