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US 12,321,105 B2Granted
Projection exposure apparatus for semiconductor lithography
AssigneeCarl Zeiss SMT GmbH
InventorsTimo Laufer, Michael Stolz
Life of this patent
Estimating the term…
Abstract
A projection exposure apparatus for semiconductor lithography comprises an optical element and a temperature recording device for detecting a temperature on a surface of the optical element via electromagnetic radiation emanating from the surface of the optical element. The temperature recording device can comprise a filter for filtering the electromagnetic radiation.
Claims20
An apparatus, comprising:
- a housing comprising a part;
- an optical element comprising an optical effective surface;
- a polarisation filter;
- and
- a temperature recording device,
- wherein:
- the apparatus is configured so that, during use of the apparatus:
- i) unpolarized electromagnetic radiation emitted by the part of the housing is incident on the optical element in a plane of incidence and reflected from the optical element to provide reflected electromagnetic radiation that is polarized perpendicular to the plane of incidence;
- ii) the reflected electromagnetic radiation is blocked by the polarisation filter from reaching the temperature recording device;
- iii) unpolarized electromagnetic radiation comprising components polarized parallel to the plane of incidence emanate from the optical effective surface due to a temperature of the optical element;
- iv) at least some of the components of the electromagnetic radiation polarized parallel to the incidence plane pass through the polarisation filter and impinge on the temperature recording device;
- and v) the temperature recording device determines the temperature of the optical effective surface based only on the electromagnetic radiation polarized parallel to the plane of incidence that impinges on the temperature recording device;
- and
- the apparatus is a projection exposure apparatus for semiconductor lithography.
11 more elements
An apparatus, comprising:
- a housing comprising a part;
- an optical element comprising an optical effective surface;
- a rotatable polarization filter;
- a lock-in amplifier;
- and
- a temperature recording device,
- wherein:
- the apparatus is configured so that during use of the apparatus:
- i) electromagnetic radiation is emitted by the part and reflected from the optical effective surface to provide a first portion of electromagnetic radiation;
- ii) electromagnetic radiation is emitted from the optical effective surface due to a temperature of the optical effective surface to provide a second portion of electromagnetic radiation;
- iii) the polarization filter has a first position in which the first portion and at least parts of the second portion of electromagnetic radiation pass through the filter and reach the temperature recording device;
- iv) the polarization filter has a second position in which the filter blocks the first portion of electromagnetic radiation from reaching the temperature recording device and at least parts of the second radiation pass the polarization filter;
- v) the lock-in amplifier controls rotation of the filter so that the temperature recording device distinguishes the first portion of electromagnetic radiation from the second portion of electromagnetic radiation;
- and vi) the temperature recording device determines the temperature of the optical effective surface based only on the second portion of the electromagnetic radiation;
- and
- the apparatus is a projection exposure apparatus for semiconductor lithography.
13 more elements
Dependencies are inferred from the claim text.