Method of removing photoresist, laminate, method of forming metallic pattern, polyimide resin and stripper

A laminate, comprising:

• a substrate;
• a release layer having a first surface and a second surface opposite to each other, wherein the first surface of the release layer is in contact with the substrate;
• and
• a photoresist layer having a third surface and a fourth surface opposite to each other, wherein the third surface of the photoresist layer is in contact with the second surface of the release layer,
• wherein there is a spacing between an edge of the third surface of the photoresist layer and an edge of the second surface of the release layer,
• wherein the release layer is formed by a polyimide resin, and the polyimide resin is obtained by performing a polymerization of tetracarboxylic dianhydrides, diamines, and phenolamines, wherein the tetracarboxylic dianhydrides comprise bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, the diamines comprise 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, bis(4-amino-3-carboxyphenyl)methane, 1,3-bis(3-aminepropyl)tetramethyldisiloxane and 4,4′-diaminodiphenyl ether, the phenolamines comprise 3-aminophenol.

A method of forming a metallic pattern, comprising:

• forming a release layer on a substrate;
• forming a photoresist layer on the release layer;
• performing an exposure and development process on the release layer and the photoresist layer to form a composite photoresist on the substrate;
• forming a metal layer on the composite photoresist and a portion of the substrate exposed by the composite photoresist;
• and
• removing the composite photoresist and a portion of the metal layer located on the composite photoresist to form a metallic pattern on the substrate,
• wherein the release layer is formed by a polyimide resin, and the polyimide resin is obtained by performing a polymerization of tetracarboxylic dianhydrides, diamines, and phenolamines, wherein the tetracarboxylic dianhydrides comprise bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, the diamines comprise 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, bis(4-amino-3-carboxyphenyl)methane, 1,3-bis(3-aminepropyl)tetramethyldisiloxane and 4,4′-diaminodiphenyl ether, the phenolamines comprise 3-aminophenol.