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AssigneeRheinisch-Westfälische Technische Hochschule (RWTH) Aachen
InventorsPatrick Bongartz, Moritz Meyer, Matthias Wessling
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A gassing unit for bubble-free introduction of process gas into a liquid in a reactor, wherein the gassing unit includes at least: first and second spaced apart gas receiving chambers, the two gas receiving chambers connected to one another via at least two two-dimensional, gas-conducting diffusion membranes including hollow fibers spaced apart from one another and at least partially fixed to one another; a gas supply receptacle on at least one gas receiving chamber; a shaft receptacle on at least one gas receiving chamber; wherein the gassing unit for gassing the liquid in the reactor is supplied with process gas via the gas supply receptacle, is set into a rotational movement via the receptacle for the shaft and forms a convection flow within the reactor via rotational movement of the gassing unit in the liquid. Further included is a method for gassing a process liquid, a gas-liquid reactor including a gassing unit, and the use of a gassing unit for supplying biological cultures with process gases.
A gassing unit for bubble-free introduction of a process gas into a liquid located in a reactor, characterized in that the gassing unit at least comprises:
A gas-liquid reactor at least comprising an outer reactor shell, a drive unit, a gas supply and a gassing unit, the gassing unit including:
A method of supplying process gases to biological cultures suspended in a process solution or adhering to the reactor interior or to the gassing unit comprising:
Dependencies are inferred from the claim text.