Texturizing a surface without bead blasting

A method of providing a texture to a surface of a component for use in a semiconductor processing chamber, comprising:

• generating a stream of photons;
• shaping the stream of photons into a beam of photons;
• scanning the beam of photons through a processing region that comprises a gas concentration of ambient air or nitrogen with a pressure generally equivalent to atmospheric pressure towards the surface of the component, the surface of the component comprising one or more holes, a first surface area defined by a first outer boundary, and a second surface area defined by a second outer boundary, wherein the first surface area is smaller than the second surface area;
• and
• distributing the beam of photons throughout the surface of the component to form a plurality of features on the surface within the first outer boundary;
• wherein the plurality of features form a periodic profile defining a surface morphology including a repeating square form, wherein the plurality of features comprise depressions, protuberances, or combinations thereof collectively forming a plurality of passageways that allow gas to be passed therethrough.