# US 12,312,689 B2 · Large-area high-density plasma processing chamber for flat panel displays > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,312,689 B2 - Document ID: US12312689B2 - Status: Granted - Kind: B2 - Application number: 16/400,923 - Filed: 2019-05-01 - Published: 2020-11-05 - Granted: 2025-05-27 - Earliest claimed: 2019-05-01 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Suhail Anwar; Yui Lun Wu; Jozef Kudela; Carl A. Sorensen; Jeevan Prakash Sequeira - Web page: https://patentgrep.com/patent/US12312689B2 ## CPC - C23C 16/45559: {Diffusion of reactive gas to substrate} - C23C 16/45565: {Shower nozzles} - C23C 16/505: using radio frequency discharges - H01J 37/3211: {Antennas, e.g. particular shapes of coils} - H01J 37/32183: {Matching circuits} - H01J 37/32449: {Gas control, e.g. control of the gas flow} - H01J 2237/3321: CVD [Chemical Vapor Deposition] - H01J 2237/3323: uniformity - H01J 2237/3325: large area - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract Embodiments described herein provide a lid assembly of a chamber for independent control of plasma density and gas distribution within the interior volume of the chamber. The lid assembly includes a plasma generation system and a gas distribution assembly. The plasma generation system includes a plurality of dielectric plates having a bottom surface oriented with respect to vacuum pressure and a top surface operable to be oriented with respect to atmospheric pressure. One or more coils are positioned on or over the plurality of dielectric plates. The gas distribution assembly includes a first diffuser and a second diffuser. The first diffuser includes a plurality of first channels intersecting a plurality of second channels of the second diffuser. ## Claims ### Claim 1 A plate for a lid assembly, the plate comprising: a plasma generation system, the plasma generation system comprising two or more cavities disposed in parallel in the plate, each cavity of the two or more cavities comprises: a plurality of recesses, each recess of the plurality of recesses having a dielectric plate of a plurality of dielectric plates disposed thereon, each of the plurality of dielectric plates having: a bottom surface operable to be oriented with respect to a first pressure; and a top surface operable to be oriented opposite to the bottom surface and with respect to a second pressure different than the first pressure; and one or more coils positioned on or over the plurality of dielectric plates in a respective cavity; and a gas distribution assembly, the gas distribution assembly comprising: a first diffuser, the first diffuser comprises: one or more first diffuser inlets disposed in the plate; and a plurality of first channels in fluid communication with at least one of the first diffuser inlets, each first channel of the plurality of first channels is disposed in the plate and is adjacent to at least one recess of the plurality of recesses; and a second diffuser, the second diffuser comprises: one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels, each of the second channels is intersecting each of the first channels; and each of the dielectric plates is disposed adjacent to adjacent first channels and is disposed adjacent to at least one of the second channels. ### Claim 2 (depends on 1) The plate of claim 1, wherein each coil of each cavity of the two or more cavities is configured to be connected to an independent power source. ### Claim 3 (depends on 2) The plate of claim 2, wherein each coil is configured to be connected to the independent power source through a match circuit. ### Claim 4 (depends on 1) The plate of claim 1, wherein each coil has one or more turns. ### Claim 5 (depends on 1) The plate of claim 1, wherein the plate comprises aluminum-containing materials. ### Claim 6 (depends on 1) The plate of claim 1, wherein the plurality of dielectric plates plates comprise at least one of aluminum oxide (Al2O3), aluminum nitride (ALN), quartz, zirconium dioxide (ZrO2), zirconium nitride (ZrN), quartz, and glass materials. ### Claim 7 (depends on 1) The plate of claim 1, wherein each second channel of the plurality of second channels is disposed in the plate between adjacent cavities. ### Claim 8 (depends on 1) The plate of claim 1, wherein the plate further comprises: a fluid inlet and a fluid outlet disposed in the plate coupleable to a heat exchanger; and a plurality of fluid channels in fluid communication with the fluid inlet and the fluid outlet, at least one of the plurality of fluid channels is disposed in the plate between adjacent cavities. ### Claim 9 (depends on 1) The plate of claim 1, wherein flow controllers are coupleable to each of the first diffuser inlets, and wherein the flow controllers are coupleable to each of the second diffuser inlets. ### Claim 10 A plate for a lid assembly, the plate comprising: a plasma generation system, the plasma generation system comprising two or more cavities disposed in parallel in the plate, each cavity of the two or more cavities comprises: a plurality of recesses, each recess of the plurality of recesses having a dielectric plate of a plurality of dielectric plates disposed thereon; and one or more coils positioned on or over the plurality of dielectric plates in a respective cavity; and a gas distribution assembly, the gas distribution assembly comprising: a first diffuser, the first diffuser comprises one or more first diffuser inlets disposed in the plate and in fluid communication with a plurality of first channels; a second diffuser, the second diffuser comprises one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels; wherein: each of the second channels is intersecting each of the first channels; and each of the dielectric plates is disposed adjacent to adjacent first channels and is disposed adjacent to at least one of the second channels. ### Claim 11 (depends on 10) The plate of claim 10, wherein flow controllers are coupleable to each of the first diffuser inlets, and wherein the flow controllers are coupleable to each of the second diffuser inlets. ### Claim 12 A chamber, comprising: a chamber body; a substrate support disposed in the chamber body; and a lid assembly plate positioned opposite the substrate support, the lid assembly plate and the substrate support defining a processing region in the chamber body, the lid assembly plate comprises: a plasma generation system, the plasma generation system comprising two or more cavities disposed in parallel in the lid assembly plate, each cavity of the two or more cavities comprises: a plurality of recesses, each recess of the plurality of recesses having a dielectric plate of a plurality of dielectric plates disposed thereon, the plurality of dielectric plates having: a bottom surface positioned in the processing region; and a top surface positioned outside the processing region; and one or more coils positioned on or over the plurality of dielectric plates in a respective cavity; and a gas distribution assembly, the gas distribution assembly comprising a first diffuser, the first diffuser comprises: one or more first diffuser inlets disposed in the lid assembly plate; and a plurality of first channels in fluid communication with at least one of the first diffuser inlets, each first channel of the plurality of first channels is disposed in the lid assembly plate and is adjacent to at least one recess of the plurality of recesses; and a second diffuser, the second diffuser comprises: one or more second diffuser inlets disposed in the plate and in fluid communication with a plurality of second channels, each of the second channels is intersecting each of the first channels; and each of the dielectric plates is disposed adjacent to adjacent first channels and is disposed adjacent to at least one of the second channels. ### Claim 13 (depends on 12) The chamber of claim 12, wherein each coil of each cavity of the two or more cavities is configured to be connected to an independent power source. ### Claim 14 (depends on 13) The chamber of claim 13, wherein each coil is configured to be connected to the independent power source through a match circuit. ### Claim 15 (depends on 12) The chamber of claim 12, wherein each coil has one or more turns. ### Claim 16 (depends on 12) The chamber of claim 12, wherein the lid assembly plate comprises aluminum-containing materials. ### Claim 17 (depends on 12) The chamber of claim 12, wherein the plurality of dielectric plates comprise at least one of aluminum oxide (Al2O3), aluminum nitride (ALN), quartz, zirconium dioxide (ZrO2), zirconium nitride (ZrN), quartz, and glass materials. ### Claim 18 (depends on 12) The chamber of claim 12, wherein the gas distribution assembly further comprises a second diffuser comprising: one or more second diffuser inlets disposed in the lid assembly plate; and a plurality of second channels in fluid communication with at least one of the second diffuser inlets, each second channel of the plurality of second channels is disposed in the lid assembly plate between adjacent cavities.