Method for producing N-doped carbon nanomesh
AssigneeJoz̃Stefan Institute
InventorsMiran Mozetic, Alenka Vesel, Gregor Primc, Rok Zaplotnik
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Abstract
A method for deposition of nitrogen-doped nanocarbon comprises disposing molten polymer and a heated substrate in a plasma reactor; providing dense nitrogen-containing plasma in the plasma reactor in a space between the molten polymer and the heated substrate; and allowing the dense nitrogen-containing plasma to interact with both the molten polymer and the heated substrate to form a film of nitrogen-containing nanocarbon on the heated substrate.
Claims15
A method for deposition of nitrogen-doped nanocarbon comprising:
- disposing molten polymer and a heated substrate in a plasma reactor, wherein the molten polymer is at a temperature of between 20° and 600° C. and the heated substrate is at a temperature of between 30° and 1200° C.;
- providing dense nitrogen-containing plasma in the plasma reactor in a space between the molten polymer and the heated substrate, wherein providing the dense nitrogen plasma comprises applying a power used of between 1 and 30 MW/m3, and wherein the nitrogen pressure in the plasma reactor is between 1 and 50 Pa;
- and
- allowing the dense nitrogen-containing plasma to interact with both the molten polymer and the heated substrate to form a film of nitrogen-containing nanocarbon on the heated substrate;
- wherein the molten polymer comprises polyethylene terephthalate.
A method of making an electrochemical device, the method comprising:
- depositing a film of nitrogen-doped nanocarbon, comprising:
- disposing molten polymer and a heated substrate in a plasma reactor, wherein the molten polymer is at a temperature of between 20° and 600° C. and the heated substrate is at a temperature of between 30° and 1200° C.;
- providing nitrogen-containing plasma in the plasma reactor in a space between the molten polymer and the heated substrate, wherein providing the dense nitrogen plasma comprises applying a power used of between 1 and 30 MW/m3, and wherein the nitrogen pressure in the plasma reactor is between 1 and 50 Pa;
- and
- allowing the nitrogen-containing plasma to interact with both the molten polymer and the heated substrate to form the film of nitrogen-containing nanocarbon on the heated substrate;
- and
- forming an electrochemical device containing the film of nitrogen-containing nanocarbon;
- wherein the molten polymer comprises polyethylene terephthalate.
A method comprising:
- disposing a molten polymer and a substrate in a plasma reactor, wherein the molten polymer is at a temperature of between 200° C. and 500° C.;
- heating the substrate to a temperature of between 300° C. and 1200° C.;
- maintaining a pressure in the plasma reactor of between 1 and 1000 Pa;
- providing a gaseous, nitrogen-containing plasma in the plasma reactor by application of a power density of between 0.1 and 100 MW/m3;
- allowing the gaseous, nitrogen-containing plasma to interact with the molten polymer and the heated substrate to deposit a film of nitrogen-containing nanocarbon on the heated substrate;
- wherein the molten polymer comprises polyethylene terephthalate.
Dependencies are inferred from the claim text.