Sputtering target
AssigneeJX Advanced Metals Corporation
InventorsMasayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda
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Abstract
A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
Claims8
A sputtering target containing Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, wherein the sputtering target contains Ti, Nb, and O, wherein the sputtering target has a phase including all of Ti, Nb, and O, and wherein the phase has a complex oxide phase and/or a solid solution phase, wherein the complex oxide phase has a metal oxide component including Ti and Nb, wherein the solid solution phase has Nb oxide mixed with Ti and/or Ti oxide mixed with Nb, and wherein the sputtering target is free from Cr.
Dependencies are inferred from the claim text.