Subtractive microfabrication and functionalization of substrates by hydrodynamic flow confinements
AssigneesInternational Business Machines Corporation, Technion Research & Development Foundation Limited
InventorsGovind Kaigala, Federico Paratore, Moran Bercovici, Daniel Widerker, Robert Dean Lovchik
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Abstract
Patterning a substrate can be provided. A substrate is covered by an immersion liquid and a microfluidic probe head is positioned in proximity with the surface of the substrate, so as to immerse a processing surface of the probe head in the immersion liquid. Liquid flows are generated between the processing surface of the probe head and the surface of the substrate, via the probe head. The liquid flows generated include an etching flow of an etching liquid (e.g., an acid or solvent) and a processing flow of a processing liquid (e.g., a solution or suspension).
Claims17
A method of patterning a substrate, the method comprising:
- providing the substrate and a microfluidic probe head;
- covering a surface of the substrate by an immersion liquid and positioning the probe head in proximity with the surface of the substrate to immerse a processing surface of the probe head in the immersion liquid;
- and
- via the probe head, generating liquid flows between the processing surface of the probe head and the surface of the substrate, wherein the liquid flows generated include:
- an etching flow of an etching liquid that is hydrodynamically confined inside the immersion liquid to controllably structure the surface of the substrate by creating a depression in the substrate;
- and
- a processing flow of a processing liquid, wherein the processing flow is generated after having interrupted the etching flow, to pattern the depression created with particles contained in the processing liquid.
Dependencies are inferred from the claim text.