Apparatus for preventing contamination of self-plasma chamber

An apparatus comprising a self-plasma chamber comprising a shielding means, wherein the self-plasma chamber is connected to a branch pipe branching from an exhaust pipe of a process chamber to analyze components of gas generated from the process chamber,

• wherein the shielding means prevents ground-electrode material, generated due to a sputtering phenomenon when a positive charge of the plasma generated from the self-plasma chamber collides with a ground electrode connector, from being introduced into a discharge chamber,
• wherein the self-plasma chamber comprises:
• the ground electrode connector connected to the branch pipe,
• a flange formed on a one end of the ground electrode connector which is connected to the branch pipe, and
• the discharge chamber connected to an other end of the ground electrode connector and made of non-metallic material, wherein the one end of the ground electrode connector is opposite to the other end of the ground electrode connector,
• wherein the discharge chamber comprises:
• a discharge area connected to the other end of the ground electrode connector;
• a main discharge chamber extending from the discharge area, having an outer diameter smaller than an outer diameter of the discharge area, with a stepped portion being formed on an end of the discharge area connected to the main discharge chamber, and
• wherein the shielding means is installed in the discharge area.