Scanning electron microscope device, semiconductor manufacturing device, and method of controlling semiconductor manufacturing device

A scanning electron microscope (SEM) device comprising:

• an electron beam source configured to emit an electron beam;
• a lens unit disposed between the electron beam source and a stage, the stage configured to seat an object including structures having a pattern, the lens unit including a scanning coil configured to generate an electromagnetic field to provide a lens, and the lens unit including an astigmatism adjuster having a plurality of stigmators surrounding the electron beam;
• and
• a controller including processing circuitry configured to
• change a working distance between the lens unit and the object to obtain a plurality of original images,
• obtain a pattern image, in which the structures appear, and a plurality of kernel images, in which a distribution of the electron beam on the object appears, from the plurality of original images, and
• control, based on feature values extracted from the plurality of kernel images, the astigmatism adjuster to,
• adjust a focus of the lens unit by setting the working distance, and
• adjust an astigmatism of the lens unit by setting currents applied to the plurality of stigmators
• wherein the controller is configured to,
• map the feature values extracted from the plurality of kernel images to a single two-dimensional plane;
• determine a compensation data for controlling the astigmatism adjuster to adjust the astigmatism of the lens unit with reference to a representative vector of vectors connecting some of the feature values to each other;
• and
• determine the working distance of the lens unit using a feature value closest to an origin of the two-dimensional plane among the feature values.