Interferometer system and lithographic apparatus
AssigneeASML Netherlands B.V.
InventorMaarten Jozef Jansen
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AssigneeASML Netherlands B.V.
InventorMaarten Jozef Jansen
Estimating the term…
Interferometer system including a first detector for receiving a first measurement beam travelling to a reference surface; a second detector for receiving a second measurement beam travelling to the target surface; a reference variable delay path and/or measurement variable delay path and a delay path controller for adapting a delay length. A reference spectral coherence pulse occurs at the first detector, at a reference coherence arrangement and a measurement spectral coherence pulse at the second detector at a measurement coherence arrangement. A control unit receives a reference coherence signal from the first detector, and a measurement coherence signal from the second detector, and determines a zero-position of the target surface based on the reference coherence signal and the measurement coherence signal, and based on the reference coherence arrangement and the measurement coherence arrangement and/or a delay path difference between the reference coherence arrangement and the measurement coherence arrangement.
An interferometer system for determining a position of a target surface, wherein the interferometer system comprises:
Dependencies are inferred from the claim text.