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US 12,305,292 B2Granted
Use of reactive fluids in additive manufacturing and the products made therefrom
AssigneeMatheson Tri-Gas, Inc.
InventorsHideharu Shimizu, Mark W. Raynor, Daniel Tempel, Junpin Yao, Larry Wagg, Robert Torres, Jr.
Life of this patent
Estimating the term…
Abstract
The present invention generally relates to methods and apparatuses adapted to perform additive manufacturing (AM) processes and the resulting products made therefrom, and specifically, to AM processes that employ an energy beam to selectively fuse a base material to produce an object. More particularly, the invention relates to methods and systems that use reactive fluids to actively manipulate the surface chemistry of the base material prior to, during and/or after the AM process.
Claims17
An additive manufacturing method of fabricating an object on a build platform positioned within a build chamber, the method comprising:
- introducing one or more first reactive gases into said build chamber;
- introducing into said build chamber a first quantity of at least one base material, wherein said introducing step occurs without the application of energy that would alter the chemical or physical state of said first quantity of base material, said base material having a surface that is capable of being (a) chemically modified to a desired chemistry, (b) cleansed of impurities, or (c) both (i) chemically modified to a desired chemistry and (ii) cleansed of impurities;
- reacting said one or more first reactive gases solely with said first quantity of at least one base material, at a reaction zone within said build chamber spaced apart from the deposition location, wherein said reacting occurs in the absence of applied energy thereby producing during said introduction a modified base material;
- depositing on the build platform said at least one modified base material;
- applying energy to said at least one deposited modified base material to form (a) a chemically modified first layer or substrate, (b) an impurity free first layer or substrate, or (c) an impurity free chemically modified first layer or substrate;
- forming at least one additional modified layer on said (a) chemically modified first layer or substrate, (b) impurity free first layer or substrate, or (c) impurity free chemically modified first layer or substrate by reacting within said build chamber, at a reaction zone within said build chamber spaced apart from the deposition location, wherein said reacting occurs in the absence of applied energy, a second quantity of said at least one additional base material having a surface that is capable of being (a) chemically modified to a desired chemistry, (b) cleansed of impurities, or (c) both (i) chemically modified to a desired chemistry and (ii) cleansed of impurities, solely with one or more additional reactive gases, without the application of energy that would alter the chemical or physical state of said second quantity of additional base material, to produce at least one or more additional modified base material wherein said one or more additional reactive gases are
- (A) the same as said one or more first reactive gases;
- and
- (i) reactive with said at least one additional base material having said surface capable of modification to a desired chemistry by said one or more first reactive gases;
- (ii) reactive with said impurity located on the surface of said at least one additional base material having said surface capable of modification to a desired chemistry by said one or more first reactive gases;
- or
- (iii) reactive with said impurity located on the surface of said at least one additional base material;
- or
- (B) different than said one or more first reactive gases;
- and
- (i) reactive with said at least one additional base material having said surface capable of modification to a desired chemistry by said one or more-first additional reactive gases;
- or
- ii) reactive with said impurity located on the surface of said at least one additional base material having said surface capable of modification to a desired by said one or more additional reactive gases;
- or
- (iii) reactive with said impurity located on the surface of said at least one additional base material;
- depositing on said modified first layer or substrate said at least one additional modified base material;
- applying energy to said at least one additional modified base material deposited upon said (a) chemically modified first layer or substrate, (b) impurity free first layer or substrate, or (c) impurity free chemically modified first layer or substrate so as to form and fuse said at least one additional modified layer to said (a) chemically modified first layer or substrate, (b) impurity free first layer or substrate, or (c) impurity free chemically modified first layer or substrate;
- and
- continuing to form additional modified layers until the fabrication of the object is complete.
21 more elements
An additive manufacturing method of fabricating an object on a build platform positioned within a build chamber, the method comprising:
- introducing into said build chamber and depositing on the build platform a first quantity of at least one base material, wherein said introducing and depositing step occur without the application of energy that would alter the chemical or physical state of said first quantity of base material, said base material having a surface that is capable of being (a) chemically modified to a desired chemistry, (b) cleansed of impurities, or (c) both (i) chemically modified to a desired chemistry and (ii) cleansed of impurities;
- introducing one or more first reactive materials into said build chamber;
- reacting said one or more first reactive materials with said deposited first quantity of at least one base material, wherein said reacting step occurs in the absence of energy and only after said depositing step has been completed, thereby producing a modified base material, wherein said modified base material reacted solely with one or more first reactive materials, consisting of one or more first gases;
- applying energy to said at least one deposited modified base material to form (a) a chemically modified first layer or substrate, (b) an impurity free first layer or substrate, or (c) an impurity free chemically modified first layer or substrate;
- forming at least one additional modified layer on said (a) chemically modified first layer or substrate, (b) impurity free first layer or substrate, or (c) impurity free chemically modified first layer or substrate by depositing a second quantity of said at least one additional base material having a surface that is capable of being (a) chemically modified to a desired chemistry, (b) cleansed of impurities, or (c) both (i) chemically modified to a desired chemistry and (ii) cleansed of impurities on said modified first layer or substrate and reacting said second quantity of said at least one additional base material, in the absence of energy, with one or more additional reactive materials consisting of one or more gases to produce at least one or more additional modified base material wherein said one or more additional reactive gases are
- (A) the same as said one or more first reactive gases;
- and
- (i) reactive with said at least one additional base material having said surface capable of modification to a desired chemistry by said one or more first reactive gases;
- reactive with said impurity located on the surface of said at least one additional base material having said surface capable of modification to a desired chemistry by said one or more first reactive gases;
- or
- (iii) reactive with said impurity located on the surface of said at least one additional base material;
- or
- (B) different than said one or more first reactive gases;
- and
- (i) reactive with said at least one additional base material having said surface capable of modification to a desired chemistry by said one or more additional reactive gases;
- or
- (ii) reactive with said impurity located on the surface of said at least one additional base material having said surface capable of modification to a desired by said one or more additional reactive gases or
- (iii) reactive with said impurity located on the surface of said at least one additional base material;
- applying energy to said at least one additional modified base material deposited upon said (a) chemically modified first layer or substrate, (b) impurity free first layer or substrate, or (c) impurity free chemically modified first layer or substrate so as to form and fuse said at least one additional modified layer to said (a) chemically modified first layer or substrate, (b) impurity free first layer or substrate, or (c) impurity free chemically modified first layer or substrate;
- and
- continuing to form additional modified layers until the fabrication of the object is complete.
18 more elements
Dependencies are inferred from the claim text.