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US 12,304,823 B2Granted
Precipitated silica and process for its manufacture
AssigneeRhodia Operations
InventorsEmmanuelle Allain Najman, Cédric Feral-Martin, Pascaline Garbey, Laurent Guy, Sylvaine Neveu, Caroline Fayolle
Life of this patent
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Abstract
A precipitated silica containing are least one element M selected from the group consisting of B, Al, Ga and mixtures thereof and characterized by the presence of specific acid sites on its surface and a process for its manufacture. Said precipitated silica is suitable for multiple applications, for instance as catalyst or catalyst support as well as reinforcing filler in polymeric compositions.
Claims11
A precipitated silica comprising silica and
- at least one element M selected from the group consisting of B, Al, Ga and mixtures thereof in an amount in a range from 0.5 to 30.0 mol % with respect to moles of the precipitated silica;
- wherein the precipitated silica exhibits an infrared absorption spectrum having at least one peak between 1538 and 1559 cm−1 and one peak between 1612 and 1635 cm−1, said infrared absorption spectrum having been measured after chemisorption with pyridine to saturation followed by treatment under vacuum at 25° C., wherein an area under the at least one peak between 1538 and 1559 cm−1 is at least 0.04 cm−1, the area under the one peak between 1612 and 1635 cm−1 is at least 0.05 cm−1, and a ratio (area under the at least one peak between 1538 and 1559 cm−1)/(area under the one peak between 1612 and 1635 cm−1) is less than 0.80.
Dependencies are inferred from the claim text.