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US 12,298,665 B2Granted
Flow cells and methods for making the same
AssigneeIllumina, Inc.
InventorsSahngki Hong, Lewis J. Kraft
Life of this patent
Estimating the term…
Abstract
An example flow cell includes a multi-layer stack including a transparent base support; a patterned sacrificial layer over the transparent base support; and a transparent layer over the patterned sacrificial layer. The flow cell further includes first and second functionalized layers over different portions of the transparent layer, wherein at least one of the first and second functionalized layers aligns with a pattern of the patterned sacrificial layer; and first and second primer sets respectively attached to the first and second functionalized layer.
Claims16
A method, comprising:
- selectively etching a multi-layer stack including a patterned resin layer positioned over a sacrificial layer positioned over a transparent base support, thereby exposing a portion of the transparent base support and a portion of the sacrificial layer;
- by directing ultraviolet light through the transparent base support, selectively exposing a portion of a negative photoresist overlying the portion of the transparent base support to the ultraviolet light, whereby the sacrificial layer blocks the ultraviolet light from reaching an other portion of the negative photoresist, thereby utilizing the multi-layer stack to develop the portion of the negative photoresist through the portion of the transparent base support to define an insoluble negative photoresist at a predetermined region of the multi-layer stack;
- and
- applying first and second functionalized layers over the transparent base support, wherein the insoluble negative photoresist is i) present during the application of the first functionalized layer and removed prior to the application of the second functionalized layer, or ii) present during the application of the second functionalized layer and developed after the application of the first functionalized layer.
1 more element
A method, comprising:
- providing a multi-layer stack including:
- a transparent base support;
- a sacrificial layer over the transparent base support, the sacrificial layer defining a second functionalized region pattern where the transparent base support is exposed;
- a transparent layer over the sacrificial layer and over the transparent base support at the second functionalized region pattern;
- and
- a second sacrificial layer over the transparent layer, the second sacrificial layer defining a first functionalized region pattern where the transparent layer is exposed, wherein the first functionalized region pattern i) overlaps with a portion of the second functionalized region pattern or ii) is adjacent to the second functionalized region pattern;
- utilizing the multi-layer stack to develop a positive photoresist through the transparent base support to define an insoluble positive photoresist at a predetermined region of the multi-layer stack;
- utilizing the second sacrificial layer to define a first functionalized region corresponding to the first functionalized region pattern;
- and
- utilizing the insoluble positive photoresist to define a second functionalized region at least partially corresponding to the second functionalized region pattern.
7 more elements
Dependencies are inferred from the claim text.