A method for manufacturing an optical system, the method comprising:
- providing a first optical material structure formed of a first substrate material and comprising a first index of refraction across a frequency spectrum;
- providing a second optical material structure formed of the first substrate material;
- introducing a first index-affecting impurity into the second optical material structure to facilitate exhibition of a first index anomaly corresponding to a change in index of refraction from the first index of refraction to a second index of refraction across a first portion of the frequency spectrum and a change from the second index of refraction to the first index of refraction along the frequency spectrum;
- forming a first optically-diffractive structure on a surface of one of the first and second optical material structures;
- forming a first complementary structure on a surface of the other of the first and second optical material structures;
- joining the first and second optical material structures via the surfaces of the first and second optical material structures to form a first optical element comprising a first diffractive interface corresponding to a first non-planar material contact junction between the first and second optical material structures of the first optical element, the first diffractive interface being configured to manipulate in a predetermined manner an optical beam having an optical path through the first diffractive interface and having a frequency in the first portion of the frequency spectrum;
- providing a third optical material structure formed of a second substrate material and comprising the first index of refraction across the frequency spectrum;
- providing a fourth optical material structure of the second optical element, the fourth optical material structure being formed of the second substrate material;
- introducing a second index-affecting impurity into the second optical material structure to facilitate exhibition of a second index anomaly corresponding to a change in index of refraction from the first index of refraction to a third index of refraction across a second portion of the frequency spectrum and a change from the third index of refraction to the first index of refraction along the frequency spectrum;
- forming a second optically-diffractive structure on a surface of one of the third and fourth optical material structures;
- forming a second complementary structure on a surface of the other of the third and fourth optical material structures;
- joining the third and fourth optical material structures via the surfaces of the third and fourth optical material structures to form a second optical element comprising a second diffractive interface corresponding to a second non-planar material contact junction between the third and fourth optical material structures of the second optical element, the second diffractive interface being configured to manipulate in a predetermined manner the optical beam having the optical path through the second diffractive interface and having a frequency in the second portion of the frequency spectrum.