High registration particles-transferring system

A particle-transferring system comprising:

• a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern;
• a particle transfer unit comprising a transfer substrate having an outer surface configured to be offset from the first surface by a first gap, wherein the particle transfer unit is configured to remove the plurality of particles from the first surface in response to the plurality of particles being within the first gap;
• and
• a second substrate comprising a second surface configured to be offset from the outer surface of the transfer substrate by a second gap, wherein the second substrate is configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within the second gap;
• and
• one or more spacers attached to the particle transfer unit and configured to provide the first gap between the first substrate and the transfer substrate and provide the second gap between the second substrate and the transfer substrate,
• wherein the particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.