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US 12,297,535 B2Granted
Substrate processing methods and apparatus
AssigneePicosun Oy
InventorsJuhana Kostamo, Marko Pudas, Timo Malinen
Life of this patent
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Abstract
A method and a substrate processing apparatus including a vertical flow reaction chamber, a flow guiding part and a substrate support at a horizontally central area of the reaction chamber, the substrate support residing underneath the flow guiding part, and the flow guiding part forcing the vertical flow from above the flow guiding part to go round the flow guiding part on its downward way towards the substrate support.
Claims19
A substrate processing apparatus, comprising:
- a vertical flow reaction chamber;
- a flow guiding part and a substrate support at a horizontally central area of the reaction chamber,
- the substrate support residing underneath the flow guiding part, and
- the flow guiding part forcing a vertical flow from above the flow guiding part to go around the flow guiding part on a downward way towards the substrate support,
- wherein the flow guiding part comprises channels with openings formed within the flow guiding part, the openings configured to eject gas from inside of the flow guiding part to the reaction chamber.
2 more elements
A method for operating a substrate processing apparatus, comprising:
- providing a vertical flow reaction chamber having a flow guiding part and a substrate support at a horizontally central area of the reaction chamber, the substrate support residing underneath the flow guiding part, and
- the flow guiding part forcing a vertical flow from above the flow guiding part to go around the flow guiding part on its downward way towards the substrate support;
- ejecting gas from inside of the flow guiding part to the reaction chamber, via channels with openings formed within the flow guiding part.
Dependencies are inferred from the claim text.