Processing apparatus and processing method for removal processing with a light beam and having a workpiece position measurement system
AssigneeNikon Corporation
InventorYuichi Shibazaki
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AssigneeNikon Corporation
InventorYuichi Shibazaki
Estimating the term…
A processing apparatus is equipped with: a first stage system that has a table on which a workpiece is placed and moves the workpiece held by the table; a beam irradiation system that includes a condensing optical system to emit beams; and a controller to control the first stage system and the beam irradiation system, and processing is performed to a target portion of the workpiece while the table and the beams from the condensing optical system are relatively moved, and at least one of an intensity distribution of the beams at a first plane on an exit surface side of the condensing optical system and an intensity distribution of the beams at a second plane whose position in a direction of an optical axis of the condensing optical system is different from the first plane can be changed.
A processing apparatus for performing removal processing on a first workpiece by irradiating the first workpiece with a light beam, the processing apparatus comprising:
A processing method of performing removal processing on a first workpiece by irradiating the first workpiece with a light beam, the method comprising:
Dependencies are inferred from the claim text.