X-ray analysis system and method with multi-source design
AssigneeShenzhen Angstrom Excellence Technology Co. Ltd
InventorsXuena Zhang, Feng Hong, Cuihuan Wang
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Abstract
An X-ray analysis system is provided with multi-source design and an X-ray analysis method is provided with multi-source design. According to the embodiments, the X-ray analysis system includes a ray source including a plurality of ray generating devices that generate a ray; a detector that detects a signal generated due to an analyzed object being irradiated by the ray from the ray source; and a controller that controls the ray source, so that two or more ray generating devices in the ray source simultaneously generate corresponding rays to irradiate the analyzed object.
Claims16
An X-ray analysis system, comprising:
- a ray source comprising a plurality of ray generating devices configured to generate a ray;
- a detector configured to detect a signal generated due to an analyzed object being irradiated by the ray from the ray source;
- and
- a controller configured to control the ray source, so that two or more ray generating devices in the ray source simultaneously generate corresponding rays to irradiate the analyzed object,
- wherein the detector comprises at least one of:
- a fluorescence detector configured to detect a fluorescence emitted by the analyzed object due to the analyzed object being irradiated by the ray from at least one of the two or more ray generating devices to perform an X-ray fluorescence (XRF) analysis;
- a reflected light detector configured to detect a reflected light obtained by the analyzed object reflecting the ray of at least one of the two or more ray generating devices to perform an X-ray reflection (XRR) analysis;
- a diffracted light detector configured to detect a diffracted light obtained by the analyzed object diffracting the ray of at least one of the two or more ray generating devices to perform an X-ray diffraction (XRD) analysis;
- and
- a scattered light detector configured to detect a scattered light obtained by the analyzed object scattering the ray of at least one of the two or more ray generating devices to perform a small angle X-ray scattering (SAX) analysis;
- and
- wherein the detector comprises the fluorescence detector and the rays of the two or more ray generating devices are configured to be incident onto the analyzed sample at an incidence angle less than a critical angle, and the fluorescence detector is configured to directly face the analyzed sample to perform a total reflection XRF (TXRF) analysis.
An X-ray analysis method, comprising:
- generating rays simultaneously from two or more ray generating devices, respectively;
- irradiating an analyzed object with the generated rays;
- and
- detecting a signal generated due to the analyzed object being irradiated by the rays,
- wherein the signal comprises at least one of:
- a fluorescence emitted due to the analyzed object being irradiated by the ray from at least one of the two or more ray generating devices to perform an X-ray fluorescence (XRF) analysis;
- a reflected light obtained by the analyzed object reflecting the ray of at least one of the two or more ray generating devices to perform an X-ray reflection (XRR) analysis;
- a diffracted light obtained by the analyzed object diffracting the ray of at least one of the two or more ray generating devices to perform an X-ray diffraction (XRD) analysis;
- and
- a scattered light obtained by the analyzed object scattering the ray of at least one of the two or more ray generating devices to perform a small angle X-ray scattering (SAX) analysis;
- and
- wherein the detecting of the fluorescence further comprises controlling the rays of the two or more ray generating devices to be incident onto the analyzed sample at an incidence angle less than a critical angle to perform a total reflection XRF (TXRF) analysis.
Dependencies are inferred from the claim text.