Method for removing an impurity from a chlorosilane mixture
AssigneeWacker Chemie AG
InventorsJens Felix Knoth, Sebastian Bochmann, Uwe Pätzold, Sebastian Prost
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Abstract
Boron, phosphorus, arsenic, antimony and other impurities are at least partially removed from a mixture containing at least one chlorosilane and/or organochlorosilane by a) contacting the liquid mixture with a carrier material functionalized with an amidoxime of the general structural formula (I), where CAR=carrier material and R1, R2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl; and b) optionally removing the functionalized carrier material.
Claims20
A process for at least partially removing an impurity from a liquid mixture comprising at least one chlorosilane and/or organochlorosilane and at least one impurity which is a boron compound, a phosphorus compound, an arsenic compound, or an antimony compound, comprising the steps of:
- a) contacting the liquid mixture with a carrier material functionalized with an amidoxime of structural formula (I),
- where
- CAR=carrier material and R1, R2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl;
- and
- b) optionally removing the functionalized carrier material.
Dependencies are inferred from the claim text.