Methods of low-temperature/BEOL-compatible highly scalable graphene synthesis

Abstract

A method is described for migration of a deposition material across a diffusion couple deposited on a substrate to a substrate surface including: using a reactor system to facilitate the migration of one or more diffusion materials across a diffusion couple to a substrate by applying a specified pressure to facilitate the migration of the one or more diffusion materials across the diffusion couple to the substrate, where the specified pressure has a value between 14.5 psi and 125 psi, and applying a temperature to facilitate the migration of the one or more diffusion materials across a diffusion couple to the substrate, where the heatable top disk is controlled at a temperature between 25° C. and 500° C. and the heatable bottom disk is controlled at a temperature between 25° C. and 500° C., and where graphene is formed on the substrate surface.

Dependencies are inferred from the claim text.