Surface conditioner for electroless deposition
AssigneeNanyang Technological University
InventorsJian Rong Chong, Hirotaka Sato
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Abstract
A composition which conditions a surface for electroless deposition of a metal is disclosed. The composition comprises a polymer surfactant comprising repeating units of a monomer, wherein each of the repeating units comprises a functional group; a metal ion; and water, wherein the functional group in each of the repeating units forms a complex with the metal ion. In a preferred embodiment, the functional group is amine, and the surfactant comprises polyethyleneimine and/or polyallylamine. The metal ion comprises cobalt, rhodium, palladium or silver. A method of forming the composition as well as a method of electroless deposition using the composition are also disclosed.
Claims18
A composition which conditions a surface for electroless deposition of a metal, the composition comprising:
- a polymer surfactant comprising repeating units of a monomer, wherein each of the repeating units comprises a functional group;
- a metal ion;
- and
- water,
- wherein the functional group in each of the repeating units forms a complex with the metal ion, wherein the metal ion is present in the composition in a range of 0.01 wt % to 0.02 wt %, and wherein the polymer surfactant is present in the composition in a range of 0.1 wt % to 0.5 wt %.
Dependencies are inferred from the claim text.