Detection chip, using method for the same, and reaction system

A using method of a detection chip, wherein the detection chip comprises:

• a first substrate;
• a micro-cavity defining layer, being on the first substrate and defining a plurality of micro-reaction chambers;
• and
• a heating electrode, located between the first substrate and the micro-cavity defining layer, and configured to heat the plurality of micro-reaction chambers,
• wherein an orthographic projection of the plurality of micro-reaction chambers on the first substrate is within an orthographic projection of the heating electrode on the first substrate;
• and
• the plurality of micro-reaction chambers comprises a first micro-reaction chamber and a second micro-reaction chamber spaced apart from each other, and the heating electrode continuously extends from a first position corresponding to the first micro-reaction chamber to a second position corresponding to the second micro-reaction chamber;
• the heating electrode comprises one continuous electrode, orthographic projections of the plurality of micro-reaction chambers on the first substrate are within an orthographic projection of the one continuous electrode on the first substrate;
• wherein the using method comprises:
• introducing a reaction system solution into the plurality of micro-reaction chambers of the detection chip through a sample inlet of the detection chip;
• and
• driving the heating electrode to heat the plurality of micro-reaction chambers.

A detection chip, comprising:

• a first substrate;
• a micro-cavity defining layer, disposed over the first substrate and defining a plurality of micro-reaction chambers, and comprising a spacing region between the plurality of micro-reaction chambers;
• a heating electrode, disposed on the first substrate, and between the first substrate and the micro-cavity defining layer, and configured to heat the plurality of micro-reaction chambers;
• wherein orthographic projections of the plurality of micro-reaction chambers on the first substrate and an orthographic projection of the spacing region between the plurality of micro-reaction chambers on the first substrate are both within an orthographic projection of the heating electrode on the first substrate;
• an area of the orthographic projection of the heating electrode on the first substrate is greater than a sum of areas of the orthographic projections of the plurality of micro-reaction chambers on the first substrate and an area of the orthographic projection of the spacing region on the first substrate.