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US 12,276,915 B2Granted
Treatment liquid and treatment method
AssigneeFUJIFILM Corporation
InventorTetsuya Kamimura
Life of this patent
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Abstract
An object of the present invention is to provide a treatment liquid having excellent resist film removal performance and excellent residue removal performance. Another object of the present invention is to provide a treatment method. The treatment liquid of an embodiment of the present invention is a treatment liquid containing an alkali compound and a hydroxycarboxylic acid, in which abrasive particles are not substantially contained, and a content mass ratio of a content of the hydroxycarboxylic acid to a content of the alkali compound is 0.001 and 1.0.
Claims19
A treatment liquid comprising:
- at least one alkali compound selected from the group consisting of a quaternary ammonium salt and an inorganic alkali compound;
- an organic solvent;
- a hydroxycarboxylic acid, and
- an anticorrosive agent for tungsten (W) selected from the group consisting of carboxylic acid-containing polymers, polyacrylamide, polymethacrylamide and polyethylenimine,
- wherein abrasive particles are not substantially contained, and a content mass ratio of a content of the hydroxycarboxylic acid to a content of the alkali compound is 0.001 to 0.15,
- the organic solvent is an alcohol-based solvent, an ether-based solvent, or a mixture thereof, and
- the content of the organic solvent is 60% to 95% by mass with respect to a total mass of the treatment liquid.
4 more elements
A treatment liquid comprising:
- at least one polyacid compound selected from the group consisting of an isopolyacid and a heteropolyacid;
- an organic solvent;
- and
- an alkali compound,
- wherein abrasive particles are not substantially contained,
- the content of the organic solvent is 60% to 95% by mass with respect to a total mass of the treatment liquid, and
- the alkali compound is a compound represented by Formula (1),
- in Formula (1), R4A to R4D each independently represents an alkyl group having 1 to 6 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms, a benzyl group, or an aryl group, and X— represents a counter anion.
5 more elements
Dependencies are inferred from the claim text.