Electrical test of optical components via metal-insulator-semiconductor capacitor structures
AssigneeCisco Technology, Inc.
InventorsXunyuan Zhang, Ravi S. Tummidi, Tony P. Polous, Mark A Webster
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Abstract
Electrical test of optical components via metal-insulator-semiconductor capacitor structures is provided via a plurality of optical devices including a first material embedded in a second material, wherein each optical device is associated with a different thickness range of a plurality of thickness ranges for the first material; a first capacitance measurement point including the first material embedded in the second material; and a second capacitance measurement point including a region from which the first material has been replaced with the second material.
Claims20
A system, including:
- a plurality of optical devices including a first material embedded in a second material, wherein each optical device of the plurality of optical devices is associated with a different thickness range of a plurality of thickness ranges for the first material, and wherein the first material comprises a semiconductor material;
- and
- a capacitive sensor, configured to:
- measure a first capacitance at a first capacitance measurement point including the first material embedded in the second material and a second capacitance at a second capacitance measurement point including a region from which the first material has been replaced with the second material;
- and
- select, based on the first capacitance and the second capacitance, a given optical device of the plurality of optical devices.
A method, comprising:
- forming a first measurement region of a waveguide material in a waveguide layer;
- forming a second measurement region in the waveguide layer that omits the waveguide material;
- filling the second measurement region with an insulator material;
- forming a first capacitance measurement point that includes a plurality of waveguides formed in the waveguide layer and the first measurement region;
- and
- forming a second capacitance measurement point that includes the plurality of waveguides and the second measurement region.
A system, including:
- a plurality of optical devices including a first material embedded in a second material, wherein each optical device of the plurality of optical devices is associated with a different thickness range of a plurality of thickness ranges for the first material, wherein the first material comprises a semiconductor material, and wherein the plurality of optical devices are demultiplexers or multiplexers.
A system, including:
- a plurality of optical devices including a first material embedded in a second material, wherein each optical device of the plurality of optical devices is associated with a different thickness range of a plurality of thickness ranges for the first material, wherein the first material comprises a semiconductor material, and wherein the first material defines optical paths included in the plurality of optical devices.
Dependencies are inferred from the claim text.