Alkoxide compound, thin-film forming raw material, and method of producing thin-film

A method for producing a thin-film containing a metal atom or a semimetal atom on the surface of a substrate, comprising:

• vaporizing a thin-film forming raw material comprising an alkoxide compound;
• introducing the vaporized compound, into a treatment atmosphere;
• and
• subjecting the vaporized compound to decomposition and/or a chemical reaction, to thereby form the thin-film containing a metal atom or a semimetal atom on the surface of the substrate,
• wherein the alkoxide compound is represented by the following general formula (1):
• where R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent an alkyl group having 1 to 5 carbon atoms, or a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, R5 represents a hydrogen atom, a fluorine atom-containing group, or an alkyl group having 1 to 5 carbon atoms, R6 represents a fluorine atom-containing group, M represents a metal atom or a semimetal atom, and “n” represents a valence of the atom represented by M, provided that when M represents a copper atom, R3 and R4 each independently represent an alkyl group having 1 or 2 carbon atoms, and R5 represents a hydrogen atom.