Ejection subassembly pitches to match nanowell spacing

A fluid ejection system comprising:

• a substrate comprising an array of nanowells;
• a substrate stage to hold the substrate;
• an ejection head comprising:
• at least one fluidic die, a fluidic die comprising a plurality of ejection subassemblies, wherein:
• each ejection subassembly comprises a fluid actuator, an ejection chamber to hold a volume of fluid and an opening through which the volume of fluid is ejected via a fluid actuator;
• each ejection subassembly ejects fluid into nanowells of the array of nanowells;
• and
• a pitch of the ejection subassemblies on the fluidic die matches a spatial arrangement of nanowells of the array of nanowells,
• wherein the plurality of ejection subassemblies are fixed in a first position and configured to address a first group of nanowells comprising a first portion of the array of nanowells on the substrate correspoonding to the fixed positioin of the plurality of ejection subassemblies, and
• a processing device, wherein the plurality of ejection subassemblies are configured to address a second group of nanowells comprising a second portion of the array of nanowells on the substrate when the substrate is instructed, by the processing device, to move relative to the fixed position of the plurality of ejection subassemblies such that the second group of nanowells comprising the second portion of the array of nanowells on the substrate corresponds to the fixed position of the plurality of ejection subassemblies.

A method of ejecting fluid into an array of nanowells, comprising:

• receiving a fluid at a fluidic die of an ejection head;
• and
• with a plurality of ejection subassemblies of the fluidic die, ejecting the fluid into at least one group of nanowells of the array of nanowells;
• wherein:
• a pitch of the ejection subassemblies matches a spatial arrangement of the nanowells;
• each of the ejection subassemblies ejects fluid into one of the nanowells;
• the plurality of ejection subassemblies are fixed in a first position and configured to address a first group of nanowells comprising a portion of the array of nanowells on the substrate corresponding to a position of the plurality of ejection subassemblies, and
• wherein the plurality of ejection subassemblies are configured to address a second group of nanowells comprising a second portion of the array of nanowells on the substrate when the substrate is instructed, by a processing device, to move relative to the fixed positioin of the plurality of ejection subassemblies such that the second group of nanowells comprising the second portion of the array of nanowells on the substrate corresponds to the fixed position of the plurality of ejection subassemblies.