Methods for producing an etch resist pattern on a metallic surface
AssigneeKateeva, Inc.
InventorsNava Shpaisman, Moshe Frenkel
Life of this patent
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Abstract
A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface-activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch-resist mask.
Claims20
A method of forming a metallic pattern on a metallic object, the method comprising:
- chemically activating a metallic object by exposing the metallic object to an aqueous solution containing a compound selected from the group consisting of a copper salt, a ferric salt, a chromic-sulfuric acid, a persulfate salt, sodium chlorite, and hydrogen peroxide, to form metal ions;
- after chemically activating the metallic object, printing onto the activated metallic object, in a pattern, a liquid containing a polymeric component comprising an acrylate, a phosphate, a sulfonate, or any combination thereof, to form an etch mask on the activated metallic object by reaction of the polymeric component with the metal ions, the etch mask defining covered and uncovered portions of the metallic object;
- and
- performing an etching process to remove portions of the metallic object that are not covered by the etch mask to form the metallic pattern.
A method of forming a metallic pattern on a metallic object, the method comprising:
- chemically activating a metallic object by exposing the metallic object to an aqueous solution containing an ionizing compound to form metal ions;
- after chemically activating the metallic object, printing onto the activated metallic object, in a pattern, a liquid containing a reactive component comprising an acrylic component, a phosphate component, a sulfonate component, or any combination thereof, to form an etch mask on the activated metallic object by reaction of the reactive component with the metal ions, the etch mask defining covered and uncovered portions of the metallic object;
- and
- performing an etching process to remove portions of the metallic object that are not covered by the etch mask to form the metallic pattern.
A method of forming a pattern in a metallic surface, the method comprising:
- exposing a metallic surface to an aqueous solution containing an inorganic ionizing compound to form metal ions;
- printing onto the metallic surface, in a pattern, a liquid containing a reactive component comprising an acrylic component, a phosphate component, a sulfonate component, or any combination thereof, to form an etch mask on the metallic surface by reaction of the reactive component with the metal ions, the etch mask defining covered and uncovered portions of the metallic surface;
- and
- performing an etching process to etch portions of the metallic surface that are not covered by the etch mask to form the metallic pattern.
Dependencies are inferred from the claim text.