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US 12,269,241 B2Granted
Gas barrier film
AssigneeToppan Inc.
InventorsMiki Fukugami, Kaoru Furuta
Life of this patent
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Abstract
A gas barrier film including: a substrate layer containing polypropylene; a resin layer containing a copolymer of propylene and another monomer; a vapor deposition layer of an inorganic oxide; and a gas barrier layer, laminated in this order, wherein the vapor deposition layer has a thickness of 5 nm to 300 nm, the resin layer has a thickness of 0.3 μm or more, and a surface of the resin layer facing the vapor deposition layer has at least one softening temperature in a range of 100° C. to 170° C. when measured by local thermal analysis (LTA).
Claims7
A gas barrier film, comprising:
- a substrate layer containing polypropylene;
- a resin layer containing a copolymer of propylene and another monomer;
- a vapor deposition layer of an inorganic oxide;
- and
- a gas barrier layer, laminated in this order, wherein
- the vapor deposition layer has a thickness of 5 nm to 300 nm,
- the resin layer has a thickness of 0.3 μm or more, and
- a surface of the resin layer facing the vapor deposition layer has at least one softening temperature in a range of 100° C. to 170° C. when measured by local thermal analysis (LTA).
5 more elements
Dependencies are inferred from the claim text.