Substrate liquid processing apparatus and liquid discharge evaluation method

A substrate liquid processing apparatus, comprising:

• a substrate holder configured to hold a substrate;
• a rotating device configured to rotate the substrate around a rotation axis;
• a liquid supply equipped with a first liquid discharge nozzle configured to discharge a liquid having a temperature different from a temperature of the substrate, and also equipped with a nozzle moving device configured to move the first liquid discharge nozzle;
• a temperature measurement device configured to measure a spot temperature which is at least one of a temperature of a specific spot on a surface of the substrate or a temperature of the liquid on the specific spot;
• and
• a controller configured to control the liquid supply to change a landing position of the liquid on the surface of the substrate continuously by discharging the liquid toward the surface of the substrate from the first liquid discharge nozzle while moving the first liquid discharge nozzle, the controller being also configured to derive a deviation of the landing position of the liquid discharged from the first liquid discharge nozzle on the surface of the substrate by comparing first temperature information based on the spot temperature measured by the temperature measurement device when the first liquid discharge nozzle is moved along a first nozzle path with second temperature information based on the spot temperature measured by the temperature measurement device when the first liquid discharge nozzle is moved along a second nozzle path which is different from the first nozzle path.