Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound

A composition comprising:

• a compound represented by formula (2);
• and
• a solvent,
• wherein, in the formula (1), R1 and R2 each independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms;
• at least one of R1 and R2 represents a substituted or unsubstituted naphthyl group, a substituted or unsubstituted anthryl group, a substituted or unsubstituted fluorenyl group, a substituted or unsubstituted phenanthryl group, a substituted or unsubstituted phenalenyl group, a substituted or unsubstituted pyrenyl group, a substituted or unsubstituted chrysenyl group, a substituted or unsubstituted triphenylenyl group, a substituted or unsubstituted tetracenyl group, a substituted or unsubstituted perylenyl group, a substituted or unsubstituted picenyl group, a substituted or unsubstituted pentacenyl group, a substituted or unsubstituted hexacenyl group, a substituted or unsubstituted coronenyl group, a substituted or unsubstituted trinaphthylenyl group, a substituted or unsubstituted heptacenyl group, or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms;
• R3 represents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms;
• n is an integer of 2 to 10, wherein a plurality of R1s are identical or different from each other, a plurality of R2s are identical or different from each other, and a plurality of R3s are identical or different from each other;
• and R4 represents an organic group having a valency of n and having an aromatic ring which has 5 to 40 ring atoms.