Concentrated liquid of polishing composition and polishing method using same
AssigneeFujimi Incorporated
InventorYoshihiro Izawa
Life of this patent
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Abstract
An object of the present invention is to provide a unit capable of improving redispersibility in a concentrated liquid of a polishing composition containing alumina as abrasive grains. There is provided a concentrated liquid of a polishing composition which includes: particulate alumina; colloidal alumina having an aspect ratio of more than 5 and 800 or less; at least one phosphorus-containing acid selected from the group consisting of phosphoric acid, phosphoric acid condensates, organic phosphoric acids, phosphonic acids, and organic phosphonic acids; and water, where a pH of the concentrated liquid of the polishing composition is 2 or more and 4.5 or less.
Claims16
A concentrated liquid of a polishing composition comprising:
- particulate alumina;
- colloidal alumina having an aspect ratio of more than 5 and 800 or less;
- at least one phosphorus-containing acid selected from the group consisting of phosphoric acid, phosphoric acid condensates, organic phosphoric acids, phosphonic acids, and organic phosphonic acids;
- and
- water
- wherein a pH of the concentrated liquid of the polishing composition is 2 or more and 4.5 or less, and
- wherein a shape of the colloidal alumina is feathery.
Dependencies are inferred from the claim text.