Conductive film, method for producing same, conductor, resist pattern formation method, and laminate

A laminate comprising:

• a resist layer;
• and
• an antistatic film formed on a surface of the resist layer;
• wherein
• the antistatic film comprises:
• a conductive polymer (A);
• and
• a water-soluble polymer (C) having a nitrogen-containing functional group;
• the antistatic film has a thickness of 35 nm or less,
• the antistatic film has a surface resistivity of 1×1011 Ω/sq. or less,
• a standard deviation of current that flows through the antistatic film upon application of voltage to the antistatic film is 1.8 or less, and
• a peak area ratio determined by formula (I) is 0.44 or less, which is determined based on results of analysis performed by the following measurement method using a high performance liquid chromatograph mass spectrometer:
• (Measurement Method)
• a test solution (β) obtained by extracting the water-soluble polymer (C) from an aqueous solution obtained by dissolving the conductive film in water with an organic solvent (β) is analyzed using a high performance liquid chromatograph mass spectrometer, and a peak area ratio is calculated by formula (I), wherein the organic solvent (β) is any one of n-butanol, butyl acetate, and methyl isobutyl ketone,
• Area ratio=Y/(X+Y) (I),
• wherein X is a total peak area of an extracted ion chromatogram prepared with respect to ions derived from compounds having a molecular weight (M) of 600 or more from a total ion current chromatogram, Y is a total peak area of an extracted ion chromatogram prepared with respect to ions derived from compounds having a molecular weight (M) of less than 600 from the total ion current chromatogram.