Dielectric multilayer film, method for producing same and optical member using same
AssigneeKonica Minolta, Inc.
InventorsKazunari Tada, Jinichi Kasuya, Yasushi Mizumachi
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Abstract
A dielectric multilayer film is composed of a plurality of layers on a substrate. The plurality of layers includes at least one low refractive index layer and at least one high refractive index layer. The uppermost layer farthest from the substrate is the low refractive index layer. The high refractive index layer disposed on a substrate side of the uppermost layer is a functional layer containing a metal oxide with a photocatalytic function. The uppermost layer is a hydrophilic layer containing a metal oxide with a hydrophilic function and has pores that partially expose a surface of the functional layer. The average width of the pores is equal to or greater than 5 nm.
Claims26
A dielectric multilayer film composed of a plurality of layers on a substrate,
- wherein the plurality of layers includes at least one low refractive index layer and at least one high refractive index layer,
- wherein an uppermost layer farthest from the substrate is the low refractive index layer,
- wherein the high refractive index layer disposed on a substrate side of the uppermost layer is a functional layer containing a metal oxide with a photocatalytic function,
- wherein the uppermost layer is a hydrophilic layer containing a metal oxide with a hydrophilic function and has pores that partially expose a surface of the functional layer,
- wherein an average width of the pores is in a range of 5 to 1000 nm, and
- wherein the pores are through holes that partially expose the surface of the functional layer, and the functional layer is solid.
A dielectric multilayer film composed of a plurality of layers on a substrate,
- wherein the plurality of layers includes at least one low refractive index layer and at least one high refractive index layer,
- wherein an uppermost layer farthest from the substrate is the low refractive index layer,
- wherein the high refractive index layer disposed on a substrate side of the uppermost layer is a functional layer containing a metal oxide with a photocatalytic function,
- wherein the uppermost layer is a hydrophilic layer containing a metal oxide with a hydrophilic function and has pores that partially expose a surface of the functional layer,
- wherein a maximum valley depth Sv of the pores is in a range of 10 to 300 nm, and an average width of the pores is in a range of 5 to 1000 nm, and
- wherein the pores are through holes that partially expose the surface of the functional layer, and the functional layer is solid.
A dielectric multilayer film composed of a plurality of layers on a substrate,
- wherein the plurality of layers includes at least one low refractive index layer and at least one high refractive index layer,
- wherein an uppermost layer farthest from the substrate is the low refractive index layer,
- wherein the high refractive index layer disposed on a substrate side of the uppermost layer is a functional layer containing a metal oxide with a photocatalytic function,
- wherein the uppermost layer is a hydrophilic layer containing a metal oxide with a hydrophilic function and has pores that partially expose a surface of the functional layer,
- wherein an area ratio of the pores on a surface of the uppermost layer to a surface area of the uppermost layer, when the pores are observed from a normal direction, is in a range of 1% to 70%,
- wherein an average width of the pores is in a range of 5 to 1000 nm, and
- wherein the pores are through holes that partially expose the surface of the functional layer, and the functional layer is solid.
Dependencies are inferred from the claim text.