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US 12,258,356 B2Granted
Group VI precursor compounds
AssigneeEntegris, Inc.
InventorsDavid M. Ermert, Thomas H. Baum, Robert Wright, Jr.
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Abstract
The invention provides a facile process for preparing various Group VI precursor compounds useful in the vapor deposition of such Group VI metals onto solid substrates, especially microelectronic semiconductor device substrates. The process provides an effective means to obtain such volatile materials, which can then be sources of molybdenum, chromium, or tungsten-containing materials to be deposited on such substrates. Additionally, the invention provides a method for vapor deposition of such compounds onto microelectronic device substrates.
Claims7
A compound of the Formula (I)
- wherein M is chosen from molybdenum, tungsten, and chromium,
- X is chosen from bromo and iodo, and
- each L1 and L2 are the same or different and constitute:
- (i) a monodentate hydrocarbyl ligand coordinated with M, or
- (ii) are taken together to form a bidentate hydrocarbyl ligand coordinated with M,
- or wherein, when X is chloro, M is molybdenum or tungsten, and each of L1 and L2 is CH3CN,
- wherein the compound is crystalline and sufficiently pure to allow for determination of the unit cell.
4 more elements
Dependencies are inferred from the claim text.