Method for purifying hydrogen peroxide

A method for manufacturing a semiconductor device, the method comprising:

• purifying a crude product of hydrogen peroxide using a primary purification system;
• allowing a primarily purified hydrogen peroxide solution to pass through a heat exchanger;
• purifying the primarily purified hydrogen peroxide solution using an electrodeionization system;
• and
• performing a cleaning process on a semiconductor substrate using the purified hydrogen peroxide, wherein:
• the primary purification system includes at least one from among a distillation system, a resin system, a reverse osmosis system, and a combination system thereof,
• the heat exchanger is configured to adjust the temperature of the primarily purified hydrogen peroxide solution to prevent excessive oxygen generation in the electrodeionization system, and
• the heat exchanger adjusts the temperature of the primarily purified hydrogen peroxide solution to a range from −20° C. to 20° C.