Materials and processes for generating radioisotopes
AssigneeAdvanCell Isotopes Pty Limited
InventorJulian Frederick Kelly
Life of this patent
Estimating the term…
Abstract
The present disclosure generally relates to materials, processes, generators, and/or systems, for generating radioisotope. The present disclosure also generally relates to ceramic materials comprising radioisotope suitable for use in a radioisotope generator. The present disclosure also generally relates to processes, generators and/or systems, for producing and capturing radioisotope. The present disclosure also generally relates to the preparation of radioisotope solutions for use in radiopharmacy and/or other clinical applications.
Claims16
A 228Th-based generator for producing 212Pb, comprising:
- a tantalum oxide substrate having an atomic lattice and including an immobilized 228Th surface layer, wherein at least a portion of 228Th atoms from the 228Th surface layer have exchanged into the atomic lattice of the tantalum oxide substrate;
- and
- a chamber comprising a collection surface, wherein the chamber is configured to house the tantalum oxide substrate in the chamber such that the 228Th surface layer of the tantalum oxide substrate is in gaseous communication with the collection surface;
- wherein the 228Th surface layer permits emanation of gaseous 220Rn produced by radioactive decay of 228Th in the immobilized 228Th surface layer into the chamber;
- and
- 212Pb produced by radioactive decay of the gaseous 220Rn in the chamber collects on the collection surface.
A 228Th-based generator for producing 212Pb, comprising:
- a tantalum oxide substrate having an atomic lattice and including an immobilized 228Th surface layer containing at least 200 MBq of 228Th, wherein at least a portion of 228Th atoms from the 228Th surface layer have exchanged into the atomic lattice of the tantalum oxide substrate;
- and
- a chamber comprising a collection surface, wherein the chamber is configured to house the tantalum oxide substrate in the chamber such that the 228Th surface layer of the tantalum oxide substrate is in gaseous communication with the collection surface;
- wherein:
- the 228Th surface layer permits emanation of gaseous 220Rn produced by radioactive decay of 228Th in the immobilized 228Th surface layer into the chamber;
- 212Pb produced by radioactive decay of the gaseous 220Rn in the chamber collects on the collection surface;
- and
- the emanating gaseous 220Rn contains less than 0.1% 228Th as a contaminant and/or the 212Pb contains less than 0.1% 228Th as a contaminant.
Dependencies are inferred from the claim text.