Gas distribution ring for process chamber

A method of forming an integrated chip processing tool, comprising:

• forming a gas inlet to vertically extend completely through a lower ring;
• forming a gas conveyance channel within an upper surface of the lower ring and in communication with the gas inlet, wherein the gas conveyance channel extends to an interior sidewall of the lower ring;
• bringing a lower surface of an upper ring into contact with the upper surface of the lower ring, wherein the lower surface of the upper ring covers the gas conveyance channel;
• placing the upper ring and the lower ring within a groove within an upper surface of a shielding inset to form a plurality of gas vents between the shielding inset and the upper ring, the shielding inset comprising a cylindrical shaped tube arranged within a process chamber and covering a sidewall of the process chamber;
• and
• wherein the gas conveyance channel is between the gas inlet and the plurality of gas vents.

A method of forming an integrated chip processing tool, comprising:

• forming a lower ring to comprise a plurality of gas inlets arranged along a bottom surface of the lower ring and a plurality of gas conveyance channels arranged along an upper surface of the lower ring directly over the plurality of gas inlets;
• connecting an upper ring to the upper surface of the lower ring and covering the plurality of gas conveyance channels, wherein the lower ring and the upper ring form a plurality of gas outlets along opposing ends of the plurality of gas conveyance channels, the plurality of gas outlets being arranged within an interior sidewall of the lower ring;
• and
• wherein a plurality of gas conveyance paths extend between the plurality of gas inlets and the plurality of gas outlets, the plurality of gas conveyance channels having approximately equal lengths.