Electron beam irradiation apparatus with overlapping beam columns and helping columns

A controlling method for a multi-column electron beam irradiation apparatus in which a plurality of columns is arranged to be adjacent to each other,

• each column comprising an electron beam generation source that generates an electron beam respectively, a deflector that deflects the electron beam respectively, and a beam scanner that controls the deflector respectively, and
• information on a main irradiation area of each column and information on a sub-irradiation area of each column being stored in a storage of the electron beam irradiation apparatus, the main irradiation area of each column being a central part of an irradiation area of the column that can be irradiated with an electron beam by the column, and the sub-irradiation area of each column being a peripheral part of the irradiation area of the column that overlaps with the main irradiation area of a column adjacent to the column,
• the controlling method comprising:
• a step of determining, as a helping column, a column having a main irradiation area that is not included in a target irradiation area to be irradiated with an electron beam from among the plurality of columns when information on the target irradiation area is input;
• and
• a step of determining, as a helped column for the determined helping column, a column that is adjacent to the helping column and has a main irradiation area included in the target irradiation area from among the plurality of columns,
• wherein the beam scanner of the helping column performs a helping irradiation control for performing electron beam irradiation in the sub-irradiation area of the helping column, thereby irradiating the target irradiation area of the helped column with an electron beam,
• wherein the irradiation area of the helped or helper column does not move during the electron beam irradiation,
• wherein the deflector of the helping column is separately operated from the deflector of the helped column when the electron beam irradiation to the helped column is conducted, and
• wherein the main irradiation area of the helping column is not irradiated by the plurality of columns.

A control program executed in a multi-column electron beam irradiation apparatus in which a plurality of columns is arranged to be adjacent to each other,

• each column comprising an electron beam generation source that generates an electron beam respectively, a deflector that deflects the electron beam respectively, and a beam scanner that controls the deflector respectively, and
• information on a main irradiation area of each column and information on a sub-irradiation area of each column being stored in a storage of the electron beam irradiation apparatus, the main irradiation area of each column being a central part of an irradiation area of the column that can be irradiated with an electron beam by the column, and the sub-irradiation area of each column being a peripheral part of the irradiation area of the column that overlaps with the main irradiation area of a column adjacent to the column,
• wherein the control program makes the electron beam irradiation apparatus perform:
• a processing of determining, as a helping column, a column having a main irradiation area that is not included in a target irradiation area to be irradiated with an electron beam from among the plurality of columns when information on the target irradiation area is input;
• and
• a processing of determining, as a helped column for the determined helping column, a column that is adjacent to the helping column and has a main irradiation area included in the target irradiation area from among the plurality of columns, and
• the beam scanner of the helping column performs a helping irradiation control for performing electron beam irradiation in the sub-irradiation area of the helping column, thereby irradiating the target irradiation area of the helped column with an electron beam,
• wherein the irradiation area of the helped or helper column does not move during the electron beam irradiation,
• wherein the deflector of the helping column is separately operated from the deflector of the helped column when the electron beam irradiation to the helped column is conducted, and
• wherein the main irradiation area of the helping column is not irradiated by the plurality of columns.