Synthetic quartz glass substrate with antireflection film, window material, lid for optical element package, optical element package, and light irradiation device
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHarunobu Matsui, Daijitsu Harada, Masaki Takeuchi
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Abstract
A synthetic quartz glass substrate with an antireflection film, including: a synthetic quartz glass substrate; and an antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer containing Al2O3, a second layer containing HfO2, and a third layer containing MgF2 or SiO2 sequentially laminated on the main surface of the synthetic quartz glass substrate.
Claims13
A synthetic quartz glass substrate with an antireflection film, comprising:
- the synthetic quartz glass substrate;
- and
- the antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein
- a contact angle of the main surface of the synthetic quartz glass substrate is within 5 degrees, the contact angle being defined by a sessile drop method of JIS R 3257:1999, and
- the antireflection film includes a first layer containing Al2O3, a second layer containing HfO2, and a third layer containing MgF2 or SiO2 sequentially laminated on the main surface of the synthetic quartz glass substrate,
- wherein the synthetic quartz glass substrate satisfies a relational expression of D99.9−D50<5 nm, where D50 is a median height and D99.9 is a height of 0.1% from a highest height in a height histogram obtained by measuring, with an atomic force microscope, in a 1 μm×1 μm area, which is randomly selected, on the main surface of the synthetic quartz glass substrate.
Dependencies are inferred from the claim text.